This inventor holds 1 USPTO granted patent. Top assignee: Rca Inc.. Active years: 1980.
Company Filing History:
Years Active: 1980
Title: The Innovative Contributions of Herbert Foxman
Introduction
Herbert Foxman is a notable inventor based in Raritan, NJ (US). He has made significant contributions to the field of integrated circuit technology. His innovative approach has led to the development of a unique method for stripping photoresist, which is crucial in the manufacturing of electronic devices.
Latest Patents
Herbert Foxman holds a patent for a method of stripping photoresist. This method involves a solution of tetramethylammonium hydroxide and a surfactant in a lower alcohol. This solution effectively solubilizes photoresist films without damaging the materials found in integrated circuit devices. Following this process, a rinse with 1,1,1-trichloroethane completely removes the photoresist, ensuring the integrity of the device components.
Career Highlights
Foxman has worked at RCA Inc., where he has applied his expertise in semiconductor technology. His work has been instrumental in advancing the efficiency and effectiveness of photoresist removal processes in the industry. His innovative methods have contributed to the overall improvement of integrated circuit manufacturing.
Collaborations
One of his notable coworkers is John R. Zuber. Their collaboration has likely fostered an environment of innovation and creativity, leading to advancements in their respective fields.
Conclusion
Herbert Foxman's contributions to the field of integrated circuits through his innovative patent demonstrate his significant impact on technology. His work continues to influence the manufacturing processes of electronic devices today.