Beijing, China

Hequn Zhang

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Boe Technology Group Co., Ltd., Hefei Boe Optoelectronics Technology Co., Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hequn Zhang. Retrieved from https://idiyas.com/inventor/hequn-zhang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2017

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2 patents (USPTO):Explore Patents

Title: Hequn Zhang: Inventor in Substrate Processing and Exposure Technology

Introduction

Hequn Zhang is an inventor based in Beijing, China. His patent work addresses manufacturing processes and equipment for substrates, including exposure-pattern correction and vacuum drying. Zhang is associated with BOE Technology Group Co., Ltd. and Hefei BOE Optoelectronics Technology Co., Ltd. His listed portfolio includes 2 patents.

Latest Patents

Zhang’s recent patent work includes inventions related to exposure systems and substrate handling.

Method and Apparatus for Exposure Pattern Correction and Exposure System. This invention describes a method for correcting an exposure pattern on a substrate. It determines adjustments to the worktable’s position in two perpendicular horizontal directions, its rotation angle, and its gap from the mask plate. The worktable is then moved according to those parameters to help align the exposure pattern.

Substrate Support Structure, Vacuum Drying Apparatus and Method for Vacuum Drying a Substrate. This invention describes a support structure with a support pin and an auxiliary assembly comprising a drive device, a support rod, and a flexible support disc. The drive device moves the disc above or below the support pin, allowing the substrate to rest on either support. The design aims to reduce scratching and help prevent quality defects and uneven brightness during vacuum drying.

Career Highlights

Zhang’s listed patents focus on practical challenges in substrate manufacturing. One addresses positioning and alignment during exposure, while the other concerns supporting substrates during vacuum drying. Both inventions describe equipment and methods intended to improve handling and processing.

Collaborations

Zhang is associated with BOE Technology Group Co., Ltd. and Hefei BOE Optoelectronics Technology Co., Ltd. His listed coworkers include Hongwei Xing and Huihui Mu.

Conclusion

Hequn Zhang’s patent portfolio reflects work on exposure control and substrate support, with inventions aimed at improving precision and protecting substrates during manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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