Guangzhou, China

Heping Du

This inventor holds 1 USPTO granted patent. Top assignee: Guangzhou Newlife New Material Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Heping Du. Retrieved from https://idiyas.com/inventor/heping-du

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Heping Du - Innovator in Atomizing Technology

Introduction

Heping Du is a notable inventor based in Guangzhou, China. He has made significant contributions to the field of atomizing technology, particularly through his innovative designs and patents. His work focuses on enhancing the efficiency and functionality of atomizers, which are essential in various applications.

Latest Patents

Heping Du holds a patent for an atomizing structure and atomizer. This invention includes a ceramic part, a heating part, and a shell. The heating part is connected to the ceramic part, which is arranged within the shell. A liquid inlet region is provided on the side wall of the shell, allowing atomized liquid to enter an annular cavity surrounding the ceramic part. This design enables efficient atomization by allowing the liquid to pass through pores in the ceramic part.

Career Highlights

Heping Du is associated with Guangzhou Newlife New Material Co., Ltd., where he continues to develop innovative solutions in the field of atomization. His work has garnered attention for its practical applications and technological advancements.

Collaborations

Heping Du has collaborated with notable colleagues, including Donghuai Shi and Keqiang Wang. Their combined expertise contributes to the innovative projects undertaken at their company.

Conclusion

Heping Du's contributions to atomizing technology exemplify the spirit of innovation. His patent and ongoing work continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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