Monroe, NY, United States of America

Henry Nove

This inventor holds 1 USPTO granted patent. Top assignee: Avalara, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Henry Nove. Retrieved from https://idiyas.com/inventor/henry-nove

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Henry Nove - Innovator in Digital Document Organization

Introduction

Henry Nove is an accomplished inventor based in Monroe, NY (US). He has made significant contributions to the field of digital document management. His innovative approach has led to the development of a unique service that enhances the way users interact with digital documents.

Latest Patents

Henry Nove holds a patent for a digital document organizer service. This method, performed by a computer system, provides a comprehensive solution for managing digital documents. The process includes generating a digital document organizer for users, adding digital documents, generating and storing metadata, and facilitating user access to these documents over a network.

Career Highlights

Henry Nove is currently employed at Avalara, Inc., where he continues to innovate in the realm of digital solutions. His work focuses on improving user experience and efficiency in document management systems. With a patent portfolio that includes 1 patent, he has established himself as a key player in his field.

Collaborations

Henry collaborates with talented professionals such as Gavin Whyte and Samantha Chan. Their combined expertise contributes to the success of projects at Avalara, Inc.

Conclusion

Henry Nove's contributions to digital document organization exemplify the impact of innovative thinking in technology. His work not only streamlines document management but also enhances user accessibility and efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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