Tolland, CT, United States of America

Henry Neault

This inventor holds 1 USPTO granted patent. Top assignee: University of Hartford. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Henry Neault. Retrieved from https://idiyas.com/inventor/henry-neault

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Henry Neault

Introduction

Henry Neault is a notable inventor based in Tolland, Connecticut. He has made significant contributions to the field of surface measurement technology. His innovative approach has led to the development of a unique method for analyzing surface roughness.

Latest Patents

Henry Neault holds a patent for a "Method and apparatus for surface roughness measurement using laser." This invention features a non-contact visual system that directs a laser beam onto the surface of a workpiece. The reflected laser creates a diffraction pattern, which is captured and displayed. The intensity of this captured image is analyzed and compared with calibrated standards to determine the surface roughness of the workpiece. This method utilizes a rasterizing graphics adapter to convert video camera output into digital signals, focusing only on pixels above a predetermined brightness value.

Career Highlights

Henry Neault is affiliated with the University of Hartford, where he continues to contribute to research and innovation in his field. His work has garnered attention for its practical applications in various industries.

Collaborations

Henry collaborates with Devdas Shetty, enhancing the research and development efforts at the University of Hartford.

Conclusion

Henry Neault's innovative work in surface roughness measurement exemplifies the impact of technology on manufacturing processes. His contributions continue to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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