Elkton, MD, United States of America

Henry C Hadley, Jr

This inventor holds 1 USPTO granted patent. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Henry C Hadley, Jr. Retrieved from https://idiyas.com/inventor/henry-c-hadley-jr-jfwe2nqt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Henry C Hadley, Jr: Innovator in Photosensitive Cathodes

Introduction

Henry C Hadley, Jr. is an accomplished inventor based in Elkton, MD (US). He has made significant contributions to the field of electrochemical deposition processes. His innovative work focuses on the development of photosensitive cathodes, which have applications in various industries.

Latest Patents

Henry C Hadley, Jr. holds a patent for a photosensitive cathode designed for the deposition of metal structures within organic materials. This technology allows for the variation in three dimensions of the position, shape, and density of a metallic interlayer formed in a preformed polymer film. The electrochemical deposition process utilized in this invention represents a notable advancement in material science.

Career Highlights

Henry is currently employed at E.I. du Pont de Nemours and Company, where he continues to push the boundaries of innovation. His work at this prestigious company has allowed him to collaborate with other talented professionals in the field.

Collaborations

One of his notable coworkers is Stephen Mazur, with whom he has likely shared insights and expertise in their respective areas of research.

Conclusion

Henry C Hadley, Jr. is a prominent figure in the realm of innovation, particularly in the development of photosensitive cathodes. His contributions to the field are significant and continue to influence advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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