Heniz-W Etzkorn

Title: The Innovative Contributions of Heniz-W Etzkorn

Introduction

Heniz-W Etzkorn is a notable inventor based in Neu-Ansbach, Germany. He has made significant contributions to the field of plasma-induced chemical vapor deposition. His work focuses on enhancing the efficiency and effectiveness of coating processes for planar substrates.

Latest Patents

Heniz-W Etzkorn holds 1 patent for a groundbreaking invention titled "Plasma CVD process using a plurality of overlapping plasma columns." This patent describes a plasma process and apparatus designed for coating one or more planar substrates. The innovation involves plasma electrodes that create overlapping plasma columns, which extend over the entire surface of the substrate to be coated. The design allows for individual control of the plasma electrodes, enabling variations in spacing and angle between substrates to alter coating thickness. This process is particularly useful for applying multilayer optical coatings to large area, planar vitreous bodies.

Career Highlights

Etzkorn is associated with Schott Glaswerke, a company renowned for its expertise in glass and glass-ceramics. His work at Schott Glaswerke has positioned him as a key player in advancing coating technologies.

Collaborations

He has collaborated with notable colleagues, including Volker Paquet and Ulrich Ackermann, contributing to the development of innovative solutions in the field.

Conclusion

Heniz-W Etzkorn's contributions to plasma CVD technology exemplify the impact of innovative thinking in industrial applications. His work continues to influence advancements in coating processes, showcasing the importance of research and development in this field.