Shaanxi, China

Heng Wang

This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Heng Wang. Retrieved from https://idiyas.com/inventor/heng-wang-o5w6latd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024

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2 patents (USPTO):Explore Patents

Title: Heng Wang: Innovator in Semiconductor Etching Technologies

Introduction

Heng Wang is a prominent inventor based in Shaanxi, China, known for his contributions to semiconductor technology. With a focus on etching methods, he has developed innovative techniques that enhance the efficiency and precision of semiconductor manufacturing. His work has led to the filing of two patents, showcasing his expertise in this critical field.

Latest Patents

Heng Wang's latest patents include groundbreaking methods for etching material layers for semiconductor applications. One of his notable inventions is an apparatus and method for etching a material layer using a cyclic etching and deposition process. This method involves several steps, including etching a portion of a material layer on a substrate, forming a protection layer on the sidewalls and bottom surface of the open feature, selectively removing the protection layer from the bottom surface, and continuing to etch the material layer until the desired depth is achieved.

Another significant patent is a method of depositing a pre-etch protective layer. This method includes depositing a pre-etch protection layer conformally over the mask and the exposed portion of the substrate, followed by cyclically etching the substrate through a series of steps that ensure precision and control throughout the etching process.

Career Highlights

Heng Wang is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His role involves developing advanced etching techniques that are essential for the production of high-performance semiconductor devices. His innovative approaches have contributed to the company's reputation for excellence in technology and manufacturing.

Collaborations

Heng Wang has collaborated with several talented individuals in his field, including Jiao Yang and Alfredo Granados. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Heng Wang's contributions to semiconductor etching technologies highlight his role as an influential inventor in the industry. His innovative patents and work at Applied Materials, Inc. demonstrate his commitment to advancing semiconductor manufacturing processes. His expertise continues to shape the future of technology in this vital sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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