This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignees: Cnsig Jilantai Chlor-Alkali Chemical Co., Ltd., Nanjing Tech University. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: The Innovative Contributions of Heng Wang
Introduction
Heng Wang is a notable inventor based in Nanjing, China. He has made significant contributions to the field of chemical engineering, particularly in the area of vinyl chloride production. His innovative methods have garnered attention for their efficiency and environmental benefits.
Latest Patents
Heng Wang holds a patent for a method titled "Method for acetylene hydrochlorination to vinyl chloride catalyzed by ultra-low content aurum-based material." This method involves using a nitrogen-modified activated carbon support, enhanced by 1,10-phenanthroline as a modifier. The process utilizes a trace amount of aurum as the main active component, along with isopropanol as a solvent. The resulting ultra-low content aurum-based catalyst, with an aurum loading amount of 0.01 wt %, demonstrates high activity and selectivity for vinyl chloride production. This method is not only cost-effective but also avoids mercury pollution, making it a valuable industrial application.
Career Highlights
Heng Wang has worked at prominent institutions, including Nanjing Tech University and Cnsig Jilantai Chlor-Alkali Chemical Co., Ltd. His work in these organizations has allowed him to develop and refine his innovative methods, contributing to advancements in chemical processes.
Collaborations
Heng Wang has collaborated with notable colleagues, including Chuan Wang and Guangbin Wang. These partnerships have facilitated the exchange of ideas and expertise, further enhancing the impact of his work.
Conclusion
Heng Wang's contributions to the field of chemical engineering, particularly through his patented methods, highlight his innovative spirit and commitment to sustainable practices. His work not only advances industrial applications but also promotes environmental responsibility.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile