Heng-chung Chang

Title: The Innovations of Heng-chung Chang

Introduction

Heng-chung Chang is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of technology, particularly in the development of advanced devices. With a total of 3 patents to his name, Chang continues to push the boundaries of innovation.

Latest Patents

One of his latest patents is an "Infrared device and method for manufacturing the same." This invention includes a substrate, a metal layer, a first semiconductor layer, an absorber layer, and a second semiconductor layer. The design allows for a cavity to be formed between the first semiconductor layer and the metal layer, enhancing the device's functionality. Another significant patent is for a "MEMS device, manufacturing method of the same, and integrated MEMS module using the same." This MEMS device features a substrate with at least one contact, multiple dielectric layers, and a sealing layer that defines a chamber, showcasing Chang's expertise in micro-electromechanical systems.

Career Highlights

Heng-chung Chang is affiliated with the Industrial Technology Research Institute, where he applies his innovative skills to various projects. His work has been instrumental in advancing technology in his field.

Collaborations

Chang has collaborated with talented coworkers such as Chih-Ya Tsai and Jing-Yuan Lin, contributing to a dynamic research environment that fosters innovation.

Conclusion

Heng-chung Chang's contributions to technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to inspire advancements in infrared and MEMS technologies.