Company Filing History:
Years Active: 1998-2002
Title: Innovations of Heng Ban in Electrostatic Particle Separation
Introduction
Heng Ban is a notable inventor based in Lexington, KY (US), recognized for his contributions to the field of electrostatic particle separation. With a total of 5 patents to his name, he has developed innovative systems and methods that enhance the efficiency of particle separation processes.
Latest Patents
Heng Ban's latest patents include an electrostatic particle separation system and a method for separating a particle mixture into two constituent species. The first patent describes an electrostatic separation apparatus that utilizes a distributor for differentially tribocharging the particle species. This system supplies the charged mixture to multiple electrostatic separation cells, each equipped with a separator that features an adjustable electric field zone. This design allows for the selective drawing of charged particles, improving separation efficiency through controlled gas flows and reduced turbulence.
Another significant patent involves a particle separation system using parallel multistage electrostatic separators. This apparatus consists of several modular separation stages, each with subchambers that create electric field zones for particle separation. The design incorporates curtain gas flows to enhance the recovery of selected charged particles, ensuring a streamlined process that minimizes turbulence and maximizes efficiency.
Career Highlights
Heng Ban is affiliated with the University of Kentucky Research Foundation, where he applies his expertise in electrostatic separation technologies. His work has significantly advanced the understanding and application of particle separation methods in various industries.
Collaborations
Heng has collaborated with esteemed colleagues, including John M. Stencel and John L. Schaefer, contributing to the development of innovative solutions in his field.
Conclusion
Heng Ban's innovative work in electrostatic particle separation showcases his commitment to advancing technology in this area. His patents reflect a deep understanding of the complexities involved in particle separation, making significant contributions to both academic and practical applications.
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