Helmut Mader

Title: Helmut Mader: Innovator in Photo-sensitive Polymer Technology

Introduction

Helmut Mader is a notable inventor based in Leverkusen, Germany. He has made significant contributions to the field of polymer technology, particularly in the development of photo-sensitive materials. His innovative work has led to advancements in various applications, including photographic resists and printing plates.

Latest Patents

Mader holds a patent for a film-forming light-sensitive polymeric material carrying azidosulfonyl. This patent describes photo-sensitive film-forming soluble polymeric materials that can be insolubilized photochemically. The materials contain components that react with moieties obtained from the photochemical decomposition of azidosulfonyl groups. The photo-sensitive material is designed to be insolubilized upon exposure to actinic light, making it useful in the production of photographic resists and lithographic printing plates. He has 1 patent to his name.

Career Highlights

Helmut Mader has been associated with Agfa Gevaert NV, a company known for its expertise in imaging technology. His work at Agfa has allowed him to explore and develop innovative solutions in the field of photo-sensitive materials. His contributions have been instrumental in enhancing the capabilities of imaging products.

Collaborations

Mader has collaborated with notable colleagues such as Urbain Leopold Laridon and Gerard Albert Delzenne. These collaborations have fostered a creative environment that has led to significant advancements in their respective fields.

Conclusion

Helmut Mader's contributions to the field of photo-sensitive polymer technology have made a lasting impact. His innovative patent and work at Agfa Gevaert NV highlight his role as a key figure in advancing imaging technology.