Grenzach-Wyhlen, Germany

Helmet Luther

This inventor holds 1 USPTO granted patent. Top assignee: Ciba Specialty Chemicals Corporation. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Helmet Luther. Retrieved from https://idiyas.com/inventor/helmet-luther

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Helmet Luther - Innovator in Sunscreen Technology

Introduction

Helmet Luther is a notable inventor based in Grenzach-Wyhlen, Germany. He has made significant contributions to the field of cosmetic and pharmaceutical compositions, particularly in the development of innovative sunscreen technologies. His work has implications for both human and veterinary applications.

Latest Patents

Helmet Luther holds a patent for Resorcinyl-triazines. This patent describes compounds of the formula ##STR1##, which are particularly suitable as sunscreens in various compositions. The invention highlights the potential of these compounds to enhance the effectiveness of sun protection products.

Career Highlights

Helmet Luther is associated with Ciba Specialty Chemicals Corporation, a company known for its advancements in specialty chemicals. His work at Ciba has allowed him to focus on the development of innovative solutions in the field of cosmetics and pharmaceuticals.

Collaborations

One of his notable collaborators is Jürg Haase. Together, they have worked on projects that aim to improve the efficacy and safety of sunscreen formulations.

Conclusion

Helmet Luther's contributions to sunscreen technology through his patent on Resorcinyl-triazines demonstrate his commitment to innovation in the field. His work continues to influence the development of effective sun protection products.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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