Bad Salzuflen, Germany

Helga Frahling

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Mitsubishi Hitec Paper Europe Gmbh. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Helga Frahling. Retrieved from https://idiyas.com/inventor/helga-frahling

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Helga Frahling: Innovator in Heat-Sensitive Recording Materials

Introduction

Helga Frahling is a notable inventor based in Bad Salzuflen, Germany. She has made significant contributions to the field of heat-sensitive recording materials. Her innovative work has led to the development of a unique product that enhances the efficiency of recording technologies.

Latest Patents

Helga holds a patent for a developer-free heat-sensitive recording material. This invention features a carrier substrate with a fusible layer on one side. The fusible layer consists of an amide wax with a melting point ranging from 60° C. to 180° C., an inorganic pigment, and a polymeric binder. This combination allows for improved performance in recording applications.

Career Highlights

Helga is currently employed at Mitsubishi Hitec Paper Europe GmbH, where she continues to innovate in her field. Her work has garnered attention for its practical applications and technological advancements. She has successfully combined her expertise in materials science with her passion for innovation.

Collaborations

Helga collaborates with talented individuals such as Claas Boxhammer and Ilyas Kabul. These partnerships enhance her research and development efforts, leading to more groundbreaking inventions.

Conclusion

Helga Frahling is a pioneering inventor whose work in heat-sensitive recording materials has made a significant impact in the industry. Her dedication to innovation and collaboration continues to drive advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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