Jining, China

Hejun Li

This inventor holds 1 USPTO granted patent. Top assignees: Princeton University, Shandong Lutai Holding Group Co. Ltd. Active years: 2026.


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hejun Li: Innovator in Ultra-Lightweight Aerogels

Introduction

Hejun Li is a prominent inventor based in Jining, China. He is known for his groundbreaking work in the field of aerogels, particularly focusing on ultra-lightweight materials. His innovative approach has led to significant advancements in the fabrication and application of these materials.

Latest Patents

Hejun Li holds a patent for "Ultra-lightweight graphene-HBN nanoparticle aerogels." This patent describes ultra-lightweight aerogels and methods for fabricating such aerogels from ammonia borane and a support structure. The support structure can be either two-dimensional nanostructures or hydrocarbon polymer colloids. The components are mixed and then annealed, allowing for the tuning of the aerogels' properties by controlling the ratio between the support structure and ammonia borane, or by infiltrating the aerogels with additives. He has 1 patent to his name.

Career Highlights

Throughout his career, Hejun Li has made significant contributions to the field of materials science. He has worked with prestigious institutions, including Princeton University, where he has collaborated with leading researchers in the field. His work has been instrumental in advancing the understanding and application of aerogels in various industries.

Collaborations

Hejun Li has collaborated with notable individuals, including Rodney D Priestley. Their joint efforts have furthered research and development in the area of lightweight materials, showcasing the importance of teamwork in scientific innovation.

Conclusion

Hejun Li's contributions to the field of ultra-lightweight aerogels highlight his innovative spirit and dedication to advancing materials science. His work continues to inspire future research and applications in this exciting area of technology.

Profile summary based on public USPTO records.
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