This inventor holds 1 USPTO granted patent. Top assignees: Three Tec Co., Ltd., Youth Engineering Co., Ltd. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 1 
1 out of 2 Years Active: 2008
Title: Heitaro Ban: Innovator in Plasma Technology
Introduction
Heitaro Ban is a notable inventor based in Ehime, Japan. He has made significant contributions to the field of plasma technology, particularly in the development of processing apparatuses that utilize high voltage electrodes.
Latest Patents
Ban holds a patent for an "Object processing apparatus and plasma facility comprising the same." This innovative apparatus generates plasma under atmospheric pressure in a reaction passage, allowing for effective decomposition of fluorocompounds, such as PFCs, by ensuring sufficient contact time with plasma in a compact structure. The design is simple and can be integrated into various process chambers.
Career Highlights
Throughout his career, Heitaro Ban has worked with companies such as Three Tec Co., Ltd. and Youth Engineering Co., Ltd. His experience in these organizations has contributed to his expertise in plasma technology and apparatus design.
Collaborations
Ban has collaborated with notable coworkers, including Ryohei Itatani and Mikio Deguchi, who have also contributed to advancements in the field.
Conclusion
Heitaro Ban's work in plasma technology exemplifies innovation and practical application in industrial processes. His contributions continue to influence the development of efficient processing apparatuses.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile