Hanau, Germany

Heinz-Wilhelm Pfannekuche

This inventor holds 1 USPTO granted patent. Top assignee: Leybold Aktiengesellschaft. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Heinz-Wilhelm Pfannekuche. Retrieved from https://idiyas.com/inventor/heinz-wilhelm-pfannekuche

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Heinz-Wilhelm Pfannekuche: Inventor of a Uniform-Coating Apparatus.

Introduction

Heinz-Wilhelm Pfannekuche is an inventor associated with Hanau, Germany, and Leybold Aktiengesellschaft. His recorded patent concerns an apparatus designed to produce coatings with a uniform thickness profile through cathode sputtering.

Latest Patents

Pfannekuche is credited with 1 patent: “Apparatus for the Production of Coatings of Uniform Thickness Profile on Substrates.” The invention describes a substrate carriage guided by rollers and driven through a coating chamber. Substrate disks mounted on the carriage rotate as it passes a row of permanent magnets. The magnets induce currents in magnetic disks connected to the substrate disks’ pivot shafts, causing the disks to rotate during the coating process. This arrangement is intended to help produce coatings with a uniform thickness profile.

Career Highlights

Pfannekuche’s documented patent work is associated with Leybold Aktiengesellschaft, a company known for vacuum technology and coating equipment. His invention addresses the movement and rotation of substrates during cathode sputtering.

Collaborations

Thomas Bathon and Karl Eckert are identified as Pfannekuche’s coworkers. The available information does not specify their roles in developing or patenting the apparatus.

Conclusion

Heinz-Wilhelm Pfannekuche’s recorded invention applies coordinated substrate movement and magnetically induced rotation to support uniform coating production by cathode sputtering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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