Location History:
- Dornstetten-Asch, DE (1996)
- Dornstetten-Aach, DE (2007 - 2014)
Company Filing History:
Years Active: 1996-2014
Title: Innovations by Heinz Kappler in Silicon Wafer Treatment
Introduction
Heinz Kappler is a notable inventor based in Dornstetten-Aach, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the treatment of silicon wafers. With a total of six patents to his name, Kappler's work has advanced the methods used in the manufacturing of electronic components.
Latest Patents
One of Kappler's latest patents is a method and device for treating silicon wafers. This innovative approach involves a two-step process. In the first step, silicon wafers are conveyed flat along a continuous, horizontal conveyor belt, where nozzles spray an etching solution from above to texture the wafers. Only a minimal amount of etching solution is applied from below. In the second step, the wafers are wetted exclusively from below with the etching solution to etch-polish them. Another significant patent is for a device designed for the treatment, particularly galvanization, of substrates. This contacting device features rollers with a continuous rigid external face, allowing for effective contact with uneven substrates while maintaining a relatively small contact pressure.
Career Highlights
Heinz Kappler is associated with Gebr. Schmid GmbH & Co., a company known for its expertise in manufacturing and technology solutions. His work at the company has been instrumental in developing advanced techniques for semiconductor processing.
Conclusion
Heinz Kappler's innovations in silicon wafer treatment demonstrate his commitment to advancing technology in the semiconductor industry. His patents reflect a deep understanding of the complexities involved in wafer processing, contributing to more efficient manufacturing methods.