The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2014
Filed:
Jun. 18, 2010
Applicant:
Heinz Kappler, Dornstetten-Aach, DE;
Inventor:
Heinz Kappler, Dornstetten-Aach, DE;
Assignee:
Gebr. Schmid GmbH & Co., , DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); C03C 25/68 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and device for treating silicon wafers. In a first step, the silicon wafers () are conveyed flat along a continuous, horizontal conveyor belt () and nozzles () or the like spray an etching solution () from the top onto the wafers to texture them, only little etching solution () being applied to the silicon wafers () from below. In a second step, the silicon wafers (), which are aligned as in the first step, are wetted exclusively from below with the etching solution () to etch-polish them.