Zurich, Switzerland

Heinz K Burtscher

This inventor holds 1 USPTO granted patent. Top assignee: Abb Research Ltd.. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Heinz K Burtscher. Retrieved from https://idiyas.com/inventor/heinz-k-burtscher

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Heinz K Burtscher: Innovator in Particle Investigation Technology

Introduction

Heinz K Burtscher is a notable inventor based in Zurich, Switzerland. He has made significant contributions to the field of particle investigation technology. His innovative approach has led to the development of a unique process for analyzing particles situated in a gas.

Latest Patents

Heinz K Burtscher holds a patent for a process titled "Process for investigating particles situated in a gas." This process involves guiding a gas stream past a miniaturized UV excimer radiator. The particles within the gas are ionized and subsequently filtered out. The resultant photoelectrically induced current is then measured. This method allows for the detection of pollutants from various sources, such as petrol engines, diesel engines, and cigarette smoke, by utilizing measurements at different wavelengths.

Career Highlights

Heinz K Burtscher is associated with Abb Research Ltd., where he continues to advance his research and development efforts. His work has garnered attention for its innovative approach to environmental monitoring and pollution detection.

Collaborations

Heinz has collaborated with notable colleagues, including Daniel A Matter and Ulrich Kogelschatz. Their combined expertise has contributed to the advancement of technologies in particle investigation.

Conclusion

Heinz K Burtscher's contributions to the field of particle investigation technology highlight his innovative spirit and dedication to environmental research. His patented process represents a significant advancement in the ability to detect pollutants from various sources.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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