Heinrich Meier

Title: Heinrich Meier: Innovator in Optical Measurement Technologies

Introduction

Heinrich Meier is a notable inventor based in Urdorf, Switzerland. He has made significant contributions to the field of optical measurement technologies, holding three patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is an apparatus for measuring parameters of light spots with a moving two-dimensional knife edge mask. This invention involves a chrome grating pattern layer deposited on a slide, which is linearly moved across an incident light spot. The design allows for precise measurements by sensing the occulted light with a photocell. Another significant patent focuses on optical measurements of fine line parameters in integrated circuit processes. This invention monitors the image transfer process in large scale integrated device manufacturing by measuring a test sample with a diffraction grating. The optical measurements generated from this process help in determining line width, line depth, and line edge profile process errors, which are crucial for quality control and circuit design.

Career Highlights

Heinrich Meier is associated with RCA Inc., where he has applied his expertise in optical technologies to advance the field. His work has been instrumental in improving the accuracy and efficiency of optical measurements in integrated circuits.

Collaborations

He has collaborated with notable coworkers such as Hans P. Kleinknecht and William Edward Ham, contributing to various projects that enhance the capabilities of optical measurement technologies.

Conclusion

Heinrich Meier's innovative contributions to optical measurement technologies have established him as a prominent figure in his field. His patents reflect a deep understanding of the complexities involved in integrated circuit manufacturing and quality control.