The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 1982
Filed:
Feb. 14, 1980
Hans P Kleinknecht, Bergdietikon, CH;
Heinrich Meier, Urdorf, CH;
RCA Corporation, New York, NY (US);
Abstract
Optical monitoring of the lateral dimensions of a pattern disposed on a substrate in the form of a wafer or mask is accomplished by testing for the lateral dimensions of a diffraction grating test pattern disposed adjacent the pattern. A beam of monochromatic light such as from a laser is diffracted by the test pattern and detectors determine the intensity of the diffracted beams. The detectors are disposed in a plane orthogonal to the plane of the test pattern and to the direction of the grating lines. The detectors are selectively spaced from each other according to the periodicity d of the grating and the width of the grating lines a is determined from a relationship of the detected intensities of the beams.