Ludwigshafen, Germany

Heiner Görrissen

This inventor holds 1 USPTO granted patent. Top assignee: Basf Aktiengesellschaft. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Heiner Görrissen. Retrieved from https://idiyas.com/inventor/heiner-görrissen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Heiner Görrissen: Innovator in Styrene Copolymers

Introduction

Heiner Görrissen is a notable inventor based in Ludwigshafen, Germany. He is recognized for his contributions to the field of materials science, particularly in the development of styrene copolymers. His innovative work has led to advancements that enhance the chemical resistance of these materials.

Latest Patents

Heiner Görrissen holds a patent for "Styrene copolymers with improved resistance to chemicals." This invention focuses on the use of phyllosilicates to improve the chemical resistance, reduce swelling, and enhance stress-cracking resistance in styrene copolymers. The patent outlines a process for the preparation of these advanced materials, showcasing his expertise in polymer chemistry.

Career Highlights

Heiner Görrissen is associated with BASF Aktiengesellschaft, a leading chemical company known for its innovative solutions in various industries. His work at BASF has allowed him to contribute significantly to the development of new materials that meet the evolving needs of the market.

Collaborations

Heiner has collaborated with notable colleagues such as Peter Barghoorn and Michael Fischer. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the field.

Conclusion

Heiner Görrissen's contributions to the field of styrene copolymers demonstrate his commitment to innovation and excellence in materials science. His patent reflects a significant advancement in chemical resistance, which is crucial for various applications. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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