This inventor holds 2 USPTO granted patents. Top assignee: Outokumpu Oyj. Active years: 2003-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Kokkola, FI (2003)
- Parkki, FI (2004)
Company Filing History:
Years Active: 2003-2004
Title: Heikki Siirilä: Innovator in Roasting Furnace Technology
Introduction
Heikki Siirilä is a notable inventor based in Parkki, Finland. He has made significant contributions to the field of roasting furnace technology, holding 2 patents that enhance the efficiency and effectiveness of fluidized-bed roasting processes.
Latest Patents
Siirilä's latest patents include an "Arrangement and method for reducing build-up on a roasting furnace grate." This invention addresses the issue of build-up formed on the grate of a fluidized-bed furnace during the roasting of fine-grained materials, such as concentrate. The method involves feeding the concentrate into the roaster furnace from the wall and introducing oxygen-containing gas via gas jets under the grate. This process helps to fluidize the concentrate and oxidize it effectively. Additionally, he has developed a "Method for regulating a roasting furnace," which allows for independent regulation of gas flow through a separate grate section known as the overflow grate. This innovation is particularly advantageous in optimizing the roasting process.
Career Highlights
Heikki Siirilä is associated with Outokumpu Oyj, a company known for its expertise in metallurgy and materials technology. His work has contributed to advancements in the efficiency of roasting furnaces, making significant impacts in industrial applications.
Collaborations
Siirilä has collaborated with notable colleagues, including Juha Järvi and Jens Nyberg, who have also contributed to innovations in the field of roasting technology.
Conclusion
Heikki Siirilä's contributions to roasting furnace technology exemplify the importance of innovation in industrial processes. His patents reflect a commitment to improving efficiency and effectiveness in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
