Oulu, Finland

Heikki Riekki

This inventor holds 1 USPTO granted patent. Top assignee: Pulse Finland Oy. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Heikki Riekki. Retrieved from https://idiyas.com/inventor/heikki-riekki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 40(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Heikki Riekki: Innovator in Antenna Technology

Introduction

Heikki Riekki is a notable inventor based in Oulu, Finland. He has made significant contributions to the field of antenna technology, particularly in the production of internal antenna components for small radio devices. His innovative methods have paved the way for advancements in this area.

Latest Patents

Heikki Riekki holds a patent for a "Method for producing antenna components." This method involves creating internal antenna components by supporting a radiator with a flat-topped protrusion formed in a plastic blank. The process includes removing material from a conducting film to form the radiator and its conductors. The design allows for low manufacturing costs and quick production times, making it a valuable contribution to the industry.

Career Highlights

Heikki Riekki is associated with Pulse Finland Oy, where he applies his expertise in antenna technology. His work has been instrumental in developing efficient methods for producing antenna components, which are crucial for modern communication devices.

Collaborations

Heikki has collaborated with notable colleagues such as Petteri Annamaa and Kimmo Antila. Their combined efforts have contributed to the advancement of technology in their field.

Conclusion

Heikki Riekki's innovative approach to antenna component production showcases his dedication to improving technology in communication devices. His contributions are significant and continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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