This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 2004-2006.
Location History:
- Brackney, PA (US) (2004)
- Hanroth, DE (2006)
Company Filing History:
Years Active: 2004-2006
Title: Heike Appelt: Innovator in Dielectric Polymers
Introduction
Heike Appelt is a prominent inventor based in Hanroth, Germany. She has made significant contributions to the field of dielectric polymers, particularly in their application in electronics. With a total of 2 patents, her work has advanced the technology used in printed circuit boards and wiring boards.
Latest Patents
Heike Appelt's latest patents include innovations in photoimaged dielectric polymers and films. These patents describe the composition and manufacturing processes of photoimaginable polymers, which consist of a blend of polyfunctional resin and the condensation product of an epihalohydrin and a bisphenol. The polymers are cured using a photocationic initiator and are characterized by a glass transition temperature of at least about 140°C, along with a flex fatigue life of at least about 10,000 cycles at a 3% strain. Additionally, her patents allow for the optional inclusion of a specified epoxy resin to enhance flexibility without compromising the glass transition temperature.
Career Highlights
Heike Appelt is currently associated with International Business Machines Corporation (IBM), where she continues to innovate in the field of dielectric materials. Her expertise has positioned her as a key player in the development of advanced materials for electronic applications.
Collaborations
Throughout her career, Heike has collaborated with notable colleagues, including Vladimir Jakubek and David John Russell. These partnerships have further enriched her research and development efforts in the field of polymers.
Conclusion
Heike Appelt's contributions to the field of dielectric polymers have established her as a leading inventor in electronics. Her innovative patents and collaborations reflect her commitment to advancing technology in this critical area.