Heeyeop Chae

Title: Heeyeop Chae: Innovator in Plasma Reactor Technology

Introduction

Heeyeop Chae is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of plasma reactor technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and control of plasma reactors, which are essential in various industrial applications.

Latest Patents

Chae's latest patents include an endpoint detection device for realizing real-time control of plasma reactors, a plasma reactor equipped with this endpoint detection device, and a method for endpoint detection. The endpoint detection device comprises several key components, including an OES data operation unit, a data selector, a product generator, a support vector machine (SVM), and an endpoint determiner. The OES data operation unit processes reference OES data through normalization and principal component analysis (PCA). The data selector identifies and selects parts of the linear reference loading vectors. The product generator outputs at least one reference product value, while the SVM performs regression to provide a prediction product value. Finally, the endpoint determiner detects the endpoint of a process wafer etch or deposition and outputs a detection signal.

Career Highlights

Heeyeop Chae is currently employed at DMS Co., Ltd., where he continues to innovate and develop advanced technologies in plasma reactors. His expertise in this area has positioned him as a key figure in the industry.

Collaborations

Chae collaborates with Kun Joo Park, contributing to the advancement of their shared projects and innovations in plasma technology.

Conclusion

Heeyeop Chae's work in plasma reactor technology exemplifies the impact of innovative thinking in engineering. His patents reflect a commitment to improving industrial processes through advanced detection methods.