Suwon-si, South Korea

Heejun Park



Average Co-Inventor Count = 6.9

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2024

Loading Chart...
Loading Chart...
3 patents (USPTO):

Title: Heejun Park: Innovator in Semiconductor Technology

Introduction

Heejun Park is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative spirit and technical expertise.

Latest Patents

His latest patents include advancements in etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor devices. One of his notable inventions is an etching gas composition that features a first organofluorine compound with 3 to 6 carbon atoms, combined with an organosulfur compound containing 1 to 4 sulfur atoms. This composition enhances etch selectivity and improves the linearity and verticality of patterns by reducing line edge roughness (LER) and line width roughness (LWR). Another significant patent involves an electronic device that comprises multiple microphones, designed with a housing and a printed circuit board that optimizes sound transmission through strategically placed through-holes.

Career Highlights

Heejun Park has worked with prominent companies in the technology sector, including Samsung Electronics and Wonik Materials. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in semiconductor technology.

Collaborations

He has collaborated with talented individuals such as Jinwoo Kim and Minseok Shin, further enhancing his work through teamwork and shared expertise.

Conclusion

Heejun Park's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative approaches continue to influence the industry and pave the way for future advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…