Seoul, South Korea

HeeJu An

This inventor holds 1 USPTO granted patent. Top assignee: Yonsei University. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: HeeJu An. Retrieved from https://idiyas.com/inventor/heeju-an

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: HeeJu An: Innovator in Microstructure Technology

Introduction

HeeJu An is a prominent inventor based in Seoul, South Korea. He is known for his significant contributions to the field of microstructure technology. His innovative work has led to the development of advanced manufacturing methods for micro-light-emitting diodes and display devices.

Latest Patents

HeeJu An holds a patent for a microstructure array and methods of manufacturing the same. This patent includes a detailed process for creating micro-light-emitting diodes and display devices. The method involves preparing a red, green, and blue light-emitting perovskite precursor solution, coating these solutions onto a substrate, and utilizing a mold with concave micropatterns. The process culminates in the formation of a microstructure array composed of red, green, and blue light-emitting perovskite nanocrystals.

Career Highlights

HeeJu An is affiliated with Yonsei University, where he continues to advance his research and innovation in microstructure technology. His work has garnered attention for its potential applications in various display technologies.

Collaborations

HeeJu An collaborates with notable colleagues, including DoHoon Kim and JaeMin Myoung. Their combined expertise contributes to the ongoing research and development in their field.

Conclusion

HeeJu An's innovative work in microstructure technology exemplifies the impact of research and development in modern display devices. His contributions continue to shape the future of this technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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