Suwon, South Korea

Heejae Byun

This inventor holds 1 USPTO granted patent. Top assignee: Semes Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Heejae Byun. Retrieved from https://idiyas.com/inventor/heejae-byun-g79ruvpc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Heejae Byun: Innovator in Tower Lift Technology

Introduction

Heejae Byun is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of lift technology, particularly with his innovative designs and methods. His work focuses on enhancing the efficiency and safety of tower lifts.

Latest Patents

Heejae Byun holds a patent for a "Tower lift, tower lift driving method, and machine readable medium." This invention includes a rail module that extends vertically, multiple carriage modules that can move along the rail, and an interference avoidance module designed to prevent travel interference between the carriage modules. This patent showcases his commitment to improving lift systems.

Career Highlights

Heejae Byun is currently employed at Semes Co., Ltd., where he continues to develop and refine his innovative ideas. His work at the company has positioned him as a key player in the advancement of lift technology.

Collaborations

Heejae Byun collaborates with talented coworkers, including Na Hyun Lee and Sang-Oh Kim. Their combined expertise contributes to the success of their projects and innovations.

Conclusion

Heejae Byun is a pioneering inventor whose work in tower lift technology is making a significant impact in the industry. His innovative designs and methods are paving the way for safer and more efficient lift systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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