Hwaseong, South Korea

HeeChul Jung

This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Asm IP Holding B.v.. Active years: 2021-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: HeeChul Jung. Retrieved from https://idiyas.com/inventor/heechul-jung-vl5i1ldw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 314(Granted Patents)


Company Filing History:


Years Active: 2021-2024

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4 patents (USPTO):Explore Patents

Title: HeeChul Jung: Innovator in Temperature Control Technology

Introduction

HeeChul Jung is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of substrate processing technology. With a total of 4 patents to his name, Jung has demonstrated a commitment to innovation and excellence in his work.

Latest Patents

One of his latest patents is a temperature control assembly for substrate processing apparatus and method of using the same. This invention provides improved reactor systems, assemblies, and methods for controlling temperature within the reactor system, particularly focusing on the temperature of a gas supply unit. The exemplary systems and methods utilize an exhaust unit to facilitate the movement of fluid over a portion of the gas supply unit, thereby enhancing temperature control.

Career Highlights

HeeChul Jung is currently employed at Asm IP Holding B.V., where he continues to develop innovative solutions in his field. His work has been instrumental in advancing technology related to substrate processing.

Collaborations

Jung collaborates with talented coworkers, including SungHoon Jun and YonJong Jeon, who contribute to the innovative environment at Asm IP Holding B.V.

Conclusion

HeeChul Jung is a prominent inventor whose work in temperature control technology has made a significant impact in the industry. His dedication to innovation is evident through his patents and collaborations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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