Company Filing History:
Years Active: 2007
Title: Hee Yeop Chae: Innovator in Selective Etching Processes
Introduction
Hee Yeop Chae is a prominent inventor based in San Jose, CA (US). She has made significant contributions to the field of materials science, particularly in the area of selective etching processes. With a total of 2 patents to her name, her work has garnered attention for its innovative approaches and practical applications.
Latest Patents
One of her latest patents involves a selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material. This process utilizes a plasma of a gas mixture in a plasma etch chamber. The gas mixture includes a hydrofluorocarbon gas, an optional hydrogen-containing gas, an optional fluorine-rich fluorocarbon gas, nitrogen gas, oxygen gas, and an inert gas. This innovative process can achieve a SLAM to dielectric material etching selectivity ratio greater than 10:1, showcasing its effectiveness in material processing.
Career Highlights
Hee Yeop Chae is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. Her work at Applied Materials has positioned her as a key player in advancing technologies related to semiconductor manufacturing and materials processing.
Collaborations
Throughout her career, Hee Yeop Chae has collaborated with notable colleagues, including Jeremiah T P Pender and Gerardo Delgadino. These collaborations have further enriched her research and development efforts, contributing to the success of her innovative projects.
Conclusion
Hee Yeop Chae's contributions to the field of selective etching processes highlight her role as an influential inventor. Her innovative approaches and collaborations continue to drive advancements in materials science and semiconductor technology.