Cheonan, South Korea

Hee Soo Han

This inventor holds 2 USPTO granted patents and 6 published patent applications. Top assignee: Samsung Display Co., Ltd.. Active years: 2022-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hee Soo Han. Retrieved from https://idiyas.com/inventor/hee-soo-han

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2022-2023

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Hee Soo Han: Innovator in Film Peeling Technology

Introduction

Hee Soo Han is a notable inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of film peeling technology, holding two patents that showcase his innovative approach to solving complex problems in this area.

Latest Patents

His latest patents include a film peeling device and method of peeling film. This device features a chamber with a lower stage positioned on a first wall, and first to fourth grippers that can peel the sides of a film by gripping it. The film is attached to an object placed on the lower stage. Additionally, an upper stage is located on a second wall of the chamber, facing the first wall, and is capable of extending in the direction where the object is situated.

Career Highlights

Hee Soo Han is currently employed at Samsung Display Co., Ltd., where he continues to develop and refine his inventions. His work has been instrumental in advancing the technology used in film peeling processes, which are critical in various manufacturing applications.

Collaborations

He collaborates with Myunggil Choi, a talented woman in the field, contributing to the innovative projects at Samsung Display Co., Ltd.

Conclusion

Hee Soo Han's contributions to film peeling technology exemplify the spirit of innovation and collaboration in the industry. His patents reflect a commitment to enhancing manufacturing processes through advanced technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…