This inventor holds 1 USPTO granted patent. Top assignee: Charm Engineering Co., Ltd.. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Hee Se Lee: Innovator in Plasma Processing Technology
Introduction
Hee Se Lee is a notable inventor based in Icheon-si, South Korea. She has made significant contributions to the field of plasma processing technology. Her innovative work focuses on enhancing the efficiency and reliability of substrate processing.
Latest Patents
Hee Se Lee holds a patent for an "Apparatus for plasma processing and method for plasma processing." This invention provides a substrate supporter that securely holds a substrate, such as a wafer, which has a predetermined thin film pattern. The apparatus is designed to remove various impurities from the rear surface of the substrate. It includes at least one arm and a supporting portion that extends toward the substrate seating position. This design reduces the likelihood of arc discharges compared to conventional dry etching, thereby increasing process yield and product reliability.
Career Highlights
Hee Se Lee is associated with Charm Engineering Co., Ltd., where she continues to develop innovative solutions in plasma processing. Her work has been instrumental in advancing the technology used in semiconductor manufacturing.
Collaborations
Hee Se Lee collaborates with talented individuals such as Kyung Ho Lee and Jae Ho Guahk, contributing to a dynamic team focused on innovation.
Conclusion
Hee Se Lee's contributions to plasma processing technology exemplify her commitment to innovation and excellence in her field. Her patent and ongoing work at Charm Engineering Co., Ltd. highlight her role as a leading inventor in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile