Seongnam, South Korea

Hee Jung Jung

This inventor holds 1 USPTO granted patent. Top assignee: Dongjin Semichem Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hee Jung Jung. Retrieved from https://idiyas.com/inventor/hee-jung-jung-5icdf9b5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Hee Jung Jung - Innovator in Coating Technology

Introduction

Hee Jung Jung is a notable inventor based in Seongnam-si, South Korea. She has made significant contributions to the field of coating technology, particularly in methods that prevent substrate warpage. Her innovative approach has garnered attention in the industry.

Latest Patents

Hee Jung Jung holds a patent for a "Coating method for preventing bending phenomenon of substrate." This invention relates to a method that involves forming two or more coating layers on a substrate using compositions with varying densities. At least one of these layers is cured with a silsesquioxane composite polymer, which not only prevents warpage but also enhances surface properties such as hardness, transparency, scratch resistance, and thermal stability. She has 1 patent to her name.

Career Highlights

Hee Jung Jung is currently employed at Dongjin Semichem Co., Ltd., where she continues to develop innovative solutions in coating technology. Her work has been instrumental in advancing the capabilities of substrates used in various applications.

Collaborations

Hee Jung Jung collaborates with talented individuals such as Kyu Soon Shin and Seung Sock Choi, contributing to a dynamic work environment that fosters innovation.

Conclusion

Hee Jung Jung's contributions to coating technology exemplify her commitment to innovation and excellence. Her patent reflects her expertise and dedication to improving substrate performance in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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