Yuseong, South Korea

Hee Hyeong Moon

This inventor holds 1 USPTO granted patent. Top assignee: Sam Jung Co., Ltd.. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hee Hyeong Moon. Retrieved from https://idiyas.com/inventor/hee-hyeong-moon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Hee Hyeong Moon: Innovator in Perpendicularity Measurement

Introduction

Hee Hyeong Moon is a notable inventor based in Yusung-Gu, South Korea. He has made significant contributions to the field of measurement technology, particularly with his innovative approach to measuring perpendicularity.

Latest Patents

Hee Hyeong Moon holds a patent for a "Perpendicularity measuring method and an apparatus thereof." This invention presents a non-contacting method for measuring the perpendicularity of a straight post installed perpendicularly to a reference plane. The method involves capturing partial images of the upper and lower ends of the post in two perpendicular directions. These images are then combined to calculate inclinations or deviations, allowing for accurate measurement of perpendicularity without direct contact, thus minimizing errors.

Career Highlights

Hee Hyeong Moon is associated with Sam Jung Co., Ltd., where he applies his expertise in measurement technology. His innovative methods have enhanced the efficiency and accuracy of measurements in various applications.

Collaborations

He has collaborated with notable coworkers, including Dae-Gab Gweon and Young-Bin Cho, contributing to advancements in measurement techniques.

Conclusion

Hee Hyeong Moon's work in developing a non-contact method for measuring perpendicularity showcases his innovative spirit and dedication to improving measurement technology. His contributions are valuable to the industry and highlight the importance of precision in engineering applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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