Daejeon, South Korea

Hee-Gyon Lee

This inventor holds 1 USPTO granted patent. Top assignee: Korea Institute of Machinery & Materials. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hee-Gyon Lee. Retrieved from https://idiyas.com/inventor/hee-gyon-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2009

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hee-Gyon Lee: Innovator in Superconductor Technology

Introduction

Hee-Gyon Lee is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of materials science, particularly in the development of methods for manufacturing precursor solutions for metal organic deposition.

Latest Patents

Hee-Gyon Lee holds a patent for a "Method for manufacturing a metal organic deposition precursor solution using super-conduction oxide and film superconductor." This innovative method involves dispersing a superconducting material powder in a TFA acid aqueous solution, heating it to dissolve the powder, and subsequently creating a viscous jelly state solution for coating applications. His work is crucial for advancing thin film-type superconductors.

Career Highlights

Hee-Gyon Lee is affiliated with the Korea Institute of Machinery and Materials, where he continues to push the boundaries of research in superconducting materials. His expertise in metal organic deposition methods has positioned him as a key figure in the field.

Collaborations

Hee-Gyon Lee has collaborated with notable colleagues, including Jai-Moo Yoo and Gye-Won Hong, who contribute to the innovative research environment at the Korea Institute of Machinery and Materials.

Conclusion

Hee-Gyon Lee's work exemplifies the intersection of innovation and practical application in materials science. His contributions to superconductor technology are paving the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…