Asan, South Korea

Hee-Chang Yang

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2017.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Hee-Chang Yang: Innovator in Exposure Technology

Introduction

Hee-Chang Yang is a notable inventor based in Asan, South Korea. He has made significant contributions to the field of exposure technology, particularly in the development of methods and apparatuses that enhance the efficiency of substrate processing.

Latest Patents

Yang holds a patent for an "Exposure apparatus and exposure method using the same." This innovative method involves loading a first substrate that has a photo alignment agent coated on it. The process includes irradiating the first substrate while simultaneously loading a second substrate, utilizing an ultra violet light source to harden the photo alignment agent. This method allows for the simultaneous irradiation of both substrates, optimizing the workflow in exposure technology.

Career Highlights

Hee-Chang Yang is currently employed at Samsung Display Co., Ltd., where he continues to push the boundaries of technology in the display industry. His work has been instrumental in advancing the capabilities of exposure methods, which are critical in the manufacturing of high-quality displays.

Collaborations

Yang collaborates with talented colleagues, including Eun-Ho Jung and Tae-Jin Kim, who contribute to the innovative environment at Samsung Display Co., Ltd. Their teamwork fosters creativity and drives the development of cutting-edge technologies.

Conclusion

Hee-Chang Yang's contributions to exposure technology exemplify the impact of innovative thinking in the display industry. His patent and ongoing work at Samsung Display Co., Ltd. highlight the importance of collaboration and creativity in advancing technological solutions.

Profile summary based on public USPTO records.
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