Kanagawa, Japan

Hedeki Kina

This inventor holds 1 USPTO granted patent. Top assignees: Fuji Electric Co., Ltd., Fuji Electric Corporate Research and Developement Ltd.. Active years: 1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hedeki Kina. Retrieved from https://idiyas.com/inventor/hedeki-kina

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hedeki Kina

Introduction

Hedeki Kina is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of non-crystalline silicon technology. His work focuses on improving the performance of photosensitive materials, which has implications for various applications in imaging technology.

Latest Patents

Hedeki Kina holds 1 patent for an "Apparatus for improving the performance of non-crystalline silicon." This innovative apparatus is designed to form images on a photosensitive material of non-crystalline silicon. It effectively reduces the deterioration of image quality caused by charge storage effects by charging the photosensitive material at a polarity opposite to its initial charging before the image-forming irradiation occurs.

Career Highlights

Throughout his career, Hedeki Kina has worked with prominent companies such as Fuji Electric Co., Ltd. and Fuji Electric Corporate Research and Development Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in the field of imaging technology.

Collaborations

Hedeki Kina has collaborated with notable colleagues, including Toshiyuki Iijima and Masaharu Nanba. These collaborations have contributed to the advancement of technology in their respective fields.

Conclusion

Hedeki Kina's contributions to the field of non-crystalline silicon technology highlight his innovative spirit and dedication to improving imaging technology. His patent and collaborations reflect his significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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