The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 1986

Filed:

May. 13, 1983
Applicant:
Inventors:

Toshiyuki Iijima, Kanagawa, JP;

Hedeki Kina, Kanagawa, JP;

Masaharu Nanba, Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03G / ;
U.S. Cl.
CPC ...
355 15 ;
Abstract

An apparatus for forming images on a photosensitive material of non-crystalline silicon where the deterioration of image quality from charge storage effects is reduced by charging the photosensitive material at a polarity opposite that of its initial charging prior to the image forming irradiation of photosensitive material.


Find Patent Forward Citations

Iijima, Toshiyuki. (1986). Apparatus for improving the performance of non-crystalline silicon (U.S. Patent No. 4623243). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4623243

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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