Heather K DeSimone

Title: The Innovative Contributions of Heather K DeSimone

Introduction

Heather K DeSimone is a notable inventor based in Morgan Hill, California. She has made significant contributions to the field of electroplating, particularly in the development of stress relief techniques for electroplated films. Her innovative approach has the potential to enhance the quality and durability of electroplated materials.

Latest Patents

Heather holds a patent for her invention titled "Stress relief for electroplated films." This patent addresses the challenges associated with the delamination of electroplated films. By depositing an electroplated film over a substrate with a plating frame pattern that includes a plating field defined by multiple individual features, she has effectively reduced the delamination force at any location on the plating field. This advancement allows for the plating of films with high stress, such as high moment films, to a greater thickness than what is achievable with conventional methods. Heather has 1 patent to her name.

Career Highlights

Heather K DeSimone is currently employed at Hitachi Global Storage Technologies Netherlands B.V. Her work at this esteemed company has allowed her to apply her innovative ideas in a practical setting, contributing to advancements in storage technology.

Collaborations

Throughout her career, Heather has collaborated with talented individuals such as Christian Rene Bonhote and John W Lam. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Heather K DeSimone's contributions to the field of electroplating exemplify the impact of innovation in technology. Her patent for stress relief in electroplated films showcases her ability to solve complex problems and improve existing processes. Her work continues to inspire future advancements in the industry.