Loveland, OH, United States of America

Heather Ann Schaeffer

This inventor holds 1 USPTO granted patent. Top assignee: The Procter Gamble Company. Active years: 2005.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 66(Granted Patents)


Company Filing History:


Years Active: 2005

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Heather Ann Schaeffer: Innovator in Surface Composition Technology

Introduction

Heather Ann Schaeffer is a notable inventor based in Loveland, OH (US). She has made significant contributions to the field of surface composition technology, particularly through her innovative patent that addresses the removal of unwanted molecules from various surfaces.

Latest Patents

Heather holds a patent for "Compositions comprising cyclodextrin derivatives." This stable composition is designed to effectively remove unwanted molecules from surfaces. It includes low-degree of substitution cyclodextrin derivatives, making it suitable for capturing unwanted molecules from inanimate surfaces such as fabrics, countertops, dishes, floors, and even animate surfaces like skin and hair. The compositions can also incorporate cyclodextrin-compatible and -incompatible materials, along with other optional ingredients.

Career Highlights

Heather is currently employed at The Procter & Gamble Company, where she continues to develop innovative solutions in her field. Her work has garnered attention for its practical applications in everyday cleaning and hygiene.

Collaborations

Throughout her career, Heather has collaborated with talented individuals such as Steven Reece and Ricky Ah-man Woo. These partnerships have contributed to her success and the advancement of her projects.

Conclusion

Heather Ann Schaeffer is a pioneering inventor whose work in surface composition technology has the potential to impact various industries. Her innovative approach to removing unwanted molecules showcases her dedication to improving everyday life through science and technology.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…