Hangzhou, China

He Wei

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Zhejiang Dahua Technology Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: He Wei. Retrieved from https://idiyas.com/inventor/he-wei-axa4773k

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: He Wei - Innovator in Image Processing

Introduction

He Wei is a prominent inventor based in Hangzhou, China. He has made significant contributions to the field of image processing, showcasing his expertise through innovative solutions. His work is particularly recognized for its practical applications in enhancing image quality.

Latest Patents

He Wei holds a patent for "Systems and methods for image processing." This patent describes a system that obtains the low-frequency component of a first image. The system adjusts the luminance of each element in the image based on a predetermined luminance threshold. It also determines a luminance weight map corresponding to the first image and a second image, ultimately leading to the creation of a fused image that combines elements from both images.

Career Highlights

He Wei is associated with Zhejiang Dahua Technology Co., Ltd., a leading company in the technology sector. His role at the company has allowed him to work on cutting-edge projects that push the boundaries of image processing technology. His innovative approach has garnered attention within the industry.

Collaborations

He Wei collaborates with talented coworkers, including Song Wang and Dong Zhang. Their combined efforts contribute to the advancement of technology in their field.

Conclusion

He Wei's contributions to image processing exemplify the impact of innovation in technology. His patent and work at Zhejiang Dahua Technology Co., Ltd. highlight his role as a key player in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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