Location History:
- Ebina, JP (1994)
- Kanagawa, JP (1997)
- Kanagawa-ken, JP (1997 - 2000)
Company Filing History:
Years Active: 1994-2000
Title: Hayato Ohno: Innovator in Photoresist Technology
Introduction
Hayato Ohno is a prominent inventor based in Kanagawa-ken, Japan. He has made significant contributions to the field of photoresist technology, holding a total of 4 patents. His work focuses on developing advanced materials that enhance the performance of photoresist compositions used in various applications.
Latest Patents
One of his latest patents involves the creation of positive photoresist compositions. This innovative process includes polycondensing a phenolic compound with a mixed aldehyde, resulting in an alkali-soluble novolak resin. The resin is then utilized in conjunction with a quinonediazido group-containing compound to produce a high-performance positive photoresist composition. This composition is notable for its high feature integrity, sensitivity, and depth of focus, making it ideal for precise pattern formation.
Career Highlights
Hayato Ohno is associated with Tokyo Ohka Kogyo Co., Ltd., a company renowned for its advancements in chemical products for the semiconductor industry. His work has significantly impacted the development of photoresist materials, contributing to the efficiency and effectiveness of manufacturing processes in electronics.
Collaborations
He has collaborated with notable coworkers, including Hidekatsu Kohara and Toshimasa Nakayama. Their combined expertise has fostered innovation and progress in the field of photoresist technology.
Conclusion
Hayato Ohno's contributions to photoresist technology exemplify the importance of innovation in the semiconductor industry. His patents reflect a commitment to enhancing material performance and advancing manufacturing techniques.