This inventor holds 2 USPTO granted patents. Top assignee: Asm IP Holding B.v.. Active years: 2022.
Company Filing History:
Years Active: 2022
Title: HaSeok Jang: Innovator in Substrate Processing Technology
Introduction
HaSeok Jang is a notable inventor based in Hwaseong, South Korea. He has made significant contributions to the field of substrate processing technology, holding a total of 2 patents. His work focuses on improving the efficiency and stability of substrate processing apparatuses.
Latest Patents
One of his latest patents is a substrate processing apparatus that features an improved exhaust structure. This innovative design includes a grounded conductive extension portion that prevents the generation of parasitic plasma in the exhaust space connected to the reaction space. By doing so, the apparatus effectively prevents power loss and achieves a stable plasma process. Another patent by Jang also pertains to a substrate processing apparatus with a similar focus on exhaust structure. This design includes a reaction space formed between a processing unit and a substrate support unit, along with an exhaust unit that surrounds the reaction space. The exhaust port features a channel that connects the exhaust unit and the exhaust line, enhancing the overall functionality of the apparatus.
Career Highlights
HaSeok Jang is currently employed at ASM IP Holding B.V., where he continues to develop innovative solutions in substrate processing technology. His expertise and dedication to his work have positioned him as a key figure in his field.
Collaborations
Throughout his career, Jang has collaborated with talented individuals such as WonKi Jeong and JuIll Lee. These collaborations have contributed to the advancement of technology in substrate processing.
Conclusion
HaSeok Jang's contributions to substrate processing technology are noteworthy, and his patents reflect his commitment to innovation. His work continues to influence the industry, paving the way for future advancements.