Sendai, Japan

Harutaka Sekiya


Average Co-Inventor Count = 2.1

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Sendai, JP (2004 - 2008)
  • Tsurumi-ku, JP (2008)
  • Yokohama, JP (2016 - 2023)

Company Filing History:


Years Active: 2004-2025

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9 patents (USPTO):Explore Patents

Title: Harutaka Sekiya: Innovator in Magnetic Property Measurement

Introduction

Harutaka Sekiya is a prominent inventor based in Sendai, Japan. He has made significant contributions to the field of magnetic property measurement, holding a total of nine patents. His work focuses on improving measurement techniques and enhancing throughput in various applications.

Latest Patents

One of Sekiya's latest inventions is an inspection device designed to reduce measurement time. This device includes a stage for fixing a magnetoresistive random access memory (MRAM) and moving it within a gradient magnetic field. It features multiple magnets and line sensors that detect the magneto-optical effect at different locations on the MRAM, allowing for improved throughput. Another notable patent is a magnetic property measurement apparatus that enables quick measurement of magnetic properties without sacrificing speed. This apparatus can monitor magnetization distribution as an image using a TDI camera, facilitating highly sensitive measurements.

Career Highlights

Harutaka Sekiya is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of magnetic measurement technologies. His work has been instrumental in advancing the capabilities of measurement devices, making them more efficient and effective.

Collaborations

Sekiya has collaborated with notable colleagues, including Yuichiro Tomishima and Shinji Ueyama. Their combined expertise has contributed to the development of cutting-edge technologies in the industry.

Conclusion

Harutaka Sekiya's contributions to magnetic property measurement and his innovative patents highlight his role as a leading inventor in the field. His work continues to influence advancements in technology and measurement techniques.

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