Tokyo, Japan

Haruo Ueno

This inventor holds 6 USPTO granted patents. Top assignee: Nippon Zeon Company, Ltd.. Active years: 1980-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haruo Ueno. Retrieved from https://idiyas.com/inventor/haruo-ueno-eb69bs9r

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.1

ph-index = 6

Forward Citations = 89(Granted Patents)


Company Filing History:


Years Active: 1980-2000

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6 patents (USPTO):Explore Patents

Title: Haruo Ueno: Innovator in Photosensitive Technologies

Introduction

Haruo Ueno is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photosensitive materials, holding a total of 6 patents. His work has been instrumental in advancing technologies that utilize photosensitive compositions.

Latest Patents

Among his latest innovations are patents related to photosensitive compositions and photosensitive rubber plates. These inventions are crucial for various applications in the manufacturing and printing industries, showcasing Ueno's expertise in developing advanced materials.

Career Highlights

Haruo Ueno is associated with Nippon Zeon Company, Ltd., where he has been able to apply his innovative ideas in a practical setting. His career is marked by a commitment to research and development in the field of photosensitive technologies.

Collaborations

Ueno has collaborated with notable colleagues, including Fusayoshi Sakurai and Takao Suzuki. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Haruo Ueno's contributions to photosensitive technologies have established him as a key figure in his field. His innovative spirit and collaborative efforts continue to drive advancements in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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