Saitama, Japan

Haruo Sakamoto

This inventor holds 1 USPTO granted patent. Top assignees: Adtec Engineering Co., Ltd., Canon Components Kabushiki Kaisha. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haruo Sakamoto. Retrieved from https://idiyas.com/inventor/haruo-sakamoto-g14m9vlm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 1993

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Haruo Sakamoto: Innovator in Film Mask Technology

Introduction

Haruo Sakamoto is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of film mask technology, particularly with his innovative patent that enhances the precision of film placement.

Latest Patents

Sakamoto holds a patent for an "Apparatus for placing film mask in contact with object." This invention involves a method where a film mask is abutted to an object on one side, while a fluid is introduced on the other side to press the film mask into contact with the object. This technology is crucial for ensuring accurate film application in various industrial processes.

Career Highlights

Throughout his career, Sakamoto has worked with prominent companies such as Canon Components and Adtec Engineering Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.

Collaborations

Sakamoto has collaborated with talented individuals in his field, including Katuya Sangu and Shigeo Nagashima. These partnerships have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Haruo Sakamoto's contributions to film mask technology through his patent and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…