Tokyo, Japan

Haruo Ozawa


Average Co-Inventor Count = 2.1

ph-index = 4

Forward Citations = 161(Granted Patents)


Company Filing History:


Years Active: 1988-2002

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4 patents (USPTO):Explore Patents

Title: Haruo Ozawa: A Pioneer in Projection Exposure Technology

Introduction

Haruo Ozawa, an accomplished inventor based in Tokyo, Japan, has made significant contributions to the field of optical technology. With a remarkable portfolio of four patents, Ozawa has demonstrated a keen ability to innovate and address challenges in projection exposure apparatus design and illumination systems.

Latest Patents

Among his latest inventions, the **Projection Exposure Apparatus** stands out. This device is designed for projecting a pattern image of an illuminated mask onto a substrate. A notable feature is its optical path, which is divided into multiple hermetic blocks each sealed with inert gas through partition devices. This design includes a hermetic sealing member that provides an ideal environment for illuminating light, ensuring a substance other than oxygen replaces the atmosphere in critical areas. Additionally, the apparatus comprises independent chambers with controls responsive to oxygen density sensor readings.

Another significant invention is the **Illumination Light Source Device**. This device integrates a high-temperature mercury discharge lamp and a reflective optical member, designed for optimal heating and heat-insulation. It prevents overcooling of reflective surfaces, enhancing efficiency during operation.

Career Highlights

Haruo Ozawa has cultivated a successful career, having worked with esteemed companies such as Nikon Corporation and Nippon Kogaku K.K. His tenure at these organizations has allowed him to push the boundaries of optical technology, leading to innovative breakthroughs in the industry.

Collaborations

Throughout his career, Ozawa has collaborated with talented professionals, including Tetsuo Kikuchi and Masahiro Nakagawa. These partnerships have fostered a rich exchange of ideas and expertise, further propelling advancements in optical technologies.

Conclusion

Haruo Ozawa's inventive spirit and dedication to advancing projection exposure technology have solidified his reputation as a significant figure in the field. His innovations not only address current technological challenges but also pave the way for future developments in optical systems. With an impressive array of patents and collaborations under his belt, Ozawa undoubtedly continues to make strides in innovation, inspiring future generations of inventors.

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