The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 1988
Filed:
Nov. 28, 1984
Applicant:
Inventor:
Haruo Ozawa, Tokyo, JP;
Assignee:
Nippon Kogaku K. K., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ; G01B / ; G01B / ;
U.S. Cl.
CPC ...
364490 ; 356394 ; 356401 ; 358101 ; 364491 ;
Abstract
A method and apparatus for inspecting masks and reticles by simplifying rotational alignment thereof so as to shorten alignment time is proposed wherein a rotational angle representing a rotational error between a reference substrate and a substrate to be inspected is measured in advance, the substrate to be inspected being provided with the same circuit patterns as those of the reference substrate in one-to-one correspondence, a position of a stage having these substrates thereon is automatically measured, and a measurement error caused by the rotational error can be automatically corrected, thereby providing accurate measured values.